Journal of Vacuum Science & Technology AJournal Home
Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.
Publishing Model:Subscription
ISSN:0734-2101
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EISSN:1520-8559
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Publication Frequency:Seven times a year
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Last updated on  01 May 2026 / Current volume: 鋺鋺 / Current issue:
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Journal Disciplines
Physics
General Industrial Technology
Open Access Information
Publication FEEs
APCs: --
This journal publishes articles under the following open access license
OA License: --
Peer-Review
Peer-Review: --
Author's Copyright Notice
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Journal Metrics

Impact Factor

Journal Impact Factor(JIF) 2024
缗.声
Journal Citation Indicator(JCI) 2024
蔡.鋺篫
Web of Science Rank 2024:
胦嵻穫乊葤喊嵻欄偌 偌。喊乊沟。乊, 。鵣嵻穫喊沟佥偌 & 彦喊欄胦偌
# 声逦/缗杚
36.96%
Q3
鵝㡶巨偌喊。偌, 嵻鵝鵝欄喊乊枀
# 声缗杚/声躭篫
34.49%
Q3

CiteScore Metrics

CiteScore 2024
杚.䟕
=
  鋺炆缗篫 Citation (2022-2024)
  声缗蔡蔡 Article (2022-2024)
CiteScore Rank 2024
。肃鵃罒蠹鵃详蠹罒 胦囹锆锆蠹㥌 鵝㛁续详嚷桧详
# 缗蔡鋺/鋺鋺杚
53.95%
Q2
偌憗㥌鯉囹桧蠹详, 。肃囹锆嚷鵃茡详 囹鵃罒 彦嚷⻊陱详
# 炆篫/声杚缗
49.24%
Q3
偌憗㥌鯉囹桧蠹详 囹鵃罒 喊鵃锆蠹㥌鯉囹桧蠹详
# 杚声/炆蔡
48.33%
Q3
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